Copper foil composite including a release layer

ABSTRACT

A composite material includes a structural carrier layer and a relatively thin metal foil layer separated by a release layer. The release layer, that may be an admixture of a metal such as nickel or chromium and a non-metal such as chromium oxide, nickel oxide, chromium phosphate or nickel phosphate, provides a peel strength for the metal foil layer from the carrier strip that is typically on the order of 0.1 pound per inch to 2 pounds per inch. This provides sufficient adhesion to prevent premature separation of the metal foil layer from the carrier layer, but easy removal of the carrier layer when desired. Typically, the metal foil layer is subsequently bonded to a dielectric and the carrier layer then removed. The metal foil layer is then imaged into circuit features in the manufacture of printed circuit boards and flexible circuits.

CROSS REFERENCE TO RELATED APPLICATION

This patent application is a divisional of U.S. patent application Ser. No. 09/522,544 entitled “Peelable Thin Foil” by Szuchain Chen, et al. that was filed on Mar. 10, 2000 now U.S. Pat. No. 6,346,335. The disclosure of U.S. patent application Ser. No. 09/522,544 is incorporated by reference in its entirety herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to a composite material having an intervening release layer. More particularly, a copper foil layer is releasably bonded to a carrier layer for transport and assembly. The release layer disposed between the carrier layer and the copper foil layer facilitates separation. The copper foil layer may be laminated to a dielectric substrate in the manufacture of printed circuit boards.

2. Description of Related Art

As electronic devices evolve, there is a need for thinner and smaller printed circuits. This leads to a requirement for finer line to line spacing to increase circuit trace density.

Most printed circuit boards have a dielectric substrate, such as an epoxy or polyimide, laminated to a layer of copper foil. The copper foil is etched into a desired circuit pattern. As the need for finer line resolution increases, thinner copper foil is required. This is because when copper foil is etched, etching occurs in both a vertical direction and in a horizontal direction at about the same rate. While the vertical etching is required to create spaces between adjacent circuit traces for electrical isolation, horizontal etching at the base of a trace damages the integrity of the circuit traces. Horizontal etching limits the minimum line-to-line spacing to approximately the thickness of the copper foil. Another problem with thicker copper foil is that a longer time is required to etch the foil increasing the manufacturing cost and increasing the environmental concern due to the disposal or reclamation of dissolved copper.

One copper foil presently utilized in the manufacture of printed circuit boards is referred to as one-half ounce foil. One square foot of this foil weighs approximately 0.5 ounce and has a nominal thickness of about 18 microns. Thinner copper foil, such as 9 micron thick foil, is available in the marketplace, however special care is required in handling 9 micron foil to prevent wrinkling and damage.

Facilitating the handling of 9 micron, and thinner, foils is the use of a carrier strip. The carrier strip is releasably bonded to the foil for manufacturing and lamination. Once the foil is laminated and supported by a dielectric, the carrier strip is removed. One common carrier strip is aluminum that may be removed by chemical etching, such as by immersion in sodium hydroxide, without damage to the copper foil. Etching is time-consuming and disposal may create environmental problems.

Alternatively, a carrier layer, typically formed from copper, is coated with a release layer. The copper foil layer is formed on the release layer, typically by electrolytic deposition. Adhesion between the release layer and the copper foil layer is high enough so that the copper foil layer does not separate from the carrier layer prematurely, but is also sufficiently low that separation of the carrier layer following lamination does not tear or otherwise damage the copper foil layer.

U.S. Pat. No. 3,998,601 to Yates et al. discloses a release layer formed from either a sulphide or chromate of chromium, lead, nickel or silver. An alternative release layer is disclosed to be chromium metal. U.S. Pat. No. 4,503,112 to Konicek discloses that chromium metal release layers have unpredictable adhesion and that preferred release layers include nickel, nickel/tin alloys, nickel/iron alloys, lead and tin/lead alloys. U.S. Pat. No. 5,114,543 to Kajiwara et al. discloses a composite release layer having an immersion deposited chromate layer that is coated with an electrolytically deposited copper/nickel alloy. The U.S. Pat. Nos. 3,998,601; 4,503,112 and 5,114,543 patents are incorporated by reference herein in their entireties.

U.S. Pat. No. 5,066,366 to Lin discloses forming a release layer on a copper alloy foil carrier by treating the carrier with an aqueous solution containing chromic acid and phosphoric acid. While a generally acceptable process, areas of unacceptable high adhesion may occur when a chrome phosphate release layer is formed directly on a copper alloy carrier. U.S. Pat. No. 5,066,366 is incorporated by reference in its entirety herein.

There remains a need for an improved release layer that consistently provides adequate adhesion between a carrier layer and a copper foil layer to insure that the copper foil layer remains attached to the carrier layer during transport and processing, such as lamination to a dielectric substrate. However, the adhesion to the release layer is sufficiently low that the carrier layer may be removed following lamination without damaging the copper foil layer.

SUMMARY OF THE INVENTION

Accordingly, it is an object of the invention to provide a thin metallic foil that is releasably attached to a carrier layer. A second object of the invention is to provide a method for the manufacture of the metallic foil/carrier layer composite. A further object of the invention is to provide a thin copper foil useful for lamination to a dielectric substrate for the manufacture of printed circuit boards and flexible circuits.

It is a feature of the invention that the metal foil is releasably attached to a carrier layer and a force of at least 0.05 pound per inch is required to separate the layers thereby insuring that the metal foil layer is not prematurely released. It is a further feature of the invention that a maximum force of 2 pounds per inch, and typically less than 1 pound per inch, is required to separate the metal foil layer from the carrier layer thereby facilitating removal of the carrier layer without damage to the copper foil layer.

A further feature of the invention is that the chemical solutions utilized for deposition of the release layer are dilute aqueous solutions that are believed to present less of an environmental hazard than more concentrated electrolytes previously utilized to deposit release layers such as metallic chromium.

Among the advantages of the invention are that the metal foil layer may be a thin copper foil with a thickness of 9 microns or less. Such a thin foil facilitates the manufacture of printed circuit boards and flexible circuits with a very fine circuit trace to circuit trace pitch. A further advantage is that the carrier layer is mechanically separatable from the metal foil layer and does not require etching for removal.

A further advantage is that the foils of the invention have less surface roughness than conventionally formed foils. As a result, undercutting during etching is reduced.

In accordance with the invention, there is provided a composite material. The composite material has a support layer and a metal foil layer. A release layer is disposed between and contacts both the support layer and the metal foil layer. This release layer consists essentially of an admixture of a metal and a non-metal.

In one embodiment of the invention, the composite material is then laminated directly to a dielectric substrate.

There is further provided a method for the manufacture of a composite material that includes the steps of (1) providing an electrically conductive support layer; (2) anodically treating the electrically conductive support layer in a first aqueous electrolyte that contains first metal ions and hydroxide ions; (3) subsequently cathodically depositing a release layer onto the electrically conductive support layer in a second aqueous electrolyte that contains second metal ions and hydroxide ions; and (4) electrolytically depositing a metal foil on the release layer.

One embodiment of this method of manufacture includes the additional steps of laminating the metal foil layer to a dielectric substrate and then separating the electrically conductive support layer and the release layer from the laminate. The metal foil layer, now bonded to the dielectric layer, may then be formed into a plurality of electrically isolated circuit traces.

The above stated objects, features and advantages will become more apparent from the specification and drawings that follow.

IN THE DRAWINGS

FIG. 1 illustrates in cross-sectional representation a composite material in accordance with the invention.

FIG. 2 illustrates in cross-sectional representation the composite material of the invention laminated to a rigid dielectric as a precursor to a printed circuit board.

FIG. 3 illustrates in cross-sectional representation the composite material of the invention laminated to a flexible dielectric as a precursor to a flexible circuit.

FIG. 4 is a perspective view of the printed circuit board precursor subsequent to removal of the carrier layer.

FIG. 5 illustrates in top planar view circuitry formed from the structure of FIG. 4.

FIG. 6 illustrates an alternative release layer in cross-sectional representation.

DETAILED DESCRIPTION

FIG. 1 illustrates in cross sectional representation a composite material 10 in accordance with the invention. The composite material 10 includes a support layer 12 and a metal foil layer 14. The support layer 12 may be formed from any material capable of supporting the metal layer 14. Preferably, the support layer 12 is formed from an electrically conductive metal and has a thickness of at least 20 microns (1 micron=1×10⁻⁶ meter). Suitable materials for the carrier layer include stainless steel, aluminum, aluminum alloys, copper and copper alloys.

Preferred for the support layer are copper alloys such as those alloys designated by the CDA (Copper Development Association, New York, N.Y.) as copper alloy C110 (nominal composition by weight 99.95% copper (minimum) and 0.04% oxygen), copper alloy C715 (nominal composition by weight of 30% nickel and 70% copper), copper alloy C510 (nominal composition by weight of 94.5% copper, 5% tin and 0.2% phosphorous) and copper alloy C102 (oxygen-free high copper having a minimum copper content of, by weight, 99.9%) as well as brasses, mixtures of copper and zinc containing up to 40%, by weight, of zinc.

Most preferably, the support layer 12 is a wrought material as opposed to electrolytically formed. The wrought materials tend to have a higher strength and a higher stiffness enhancing peelability of a deposited foil. The support layer may be coated with a copper flash to cover up defects, such as incurred during rolling, that may interfere with the deposition or removal of the foil layer.

The support layer 12 may be a single material or a composite material with the second layer applied by any known process including rolling, plating and sputtering. Combinations of copper and nickel and copper and aluminum are believed useful as composite support layers.

Preferably, the thickness of the support layer 12 is from 25 microns to 140 microns and more preferably from 35 microns to 70 microns.

The metal foil layer 14 is any electrolytically deposited metal or metal alloy and is preferably copper. The metal foil layer typically has a thickness of under 10 microns and is preferably in the range of from about 3 to about 6 microns and nominally about 5 microns. As described below, the metal foil layer 14 may be deposited from a single electrolyte or from combinations of multiple electrolytes.

Disposed between and contacting both the support layer 12 and the metal foil layer 14 is a release layer 16. The release layer 16 consists essentially of an admixture of a metal and a non-metal, with the bulk believed to be the non-metal. It is believed that the metal component forms from 5% to 40%, by weight, of the release layer.

Suitable metals are those that are reversibly, electrochemically, oxidizable in a suitable electrolyte, as opposed to dissolving. The list of suitable metals includes nickel, chromium, titanium, copper, manganese, iron, cobalt, tungsten, molybdenum and tantalum.

Preferred metals are nickel, chromium and mixtures thereof. Preferred non-metals are oxides, phosphates and chromates of the metals. Preferred combinations are mixtures of chromium and chromium oxide, nickel and nickel oxide, chromium and chromium phosphate, nickel and nickel chromate, and nickel phosphate. The release layer is quite thin, on the order of 0.012 micron (120 angstroms) thick and typically from about 0.001 micron to about 0.03 micron thick.

Alternatively, the release layer 16 is a composite as illustrated in cross sectional representation in FIG. 6. A first portion 30 of the release layer 16 is a metallic layer, as described above, and is preferably selected to be nickel, chromium or a mixture thereof. This first portion 30 directly contacts the support layer 12 and is typically deposited by electroplating. Other methods of deposition such as immersion plating or vapor deposition may also be utilized.

A second portion 32 of the release layer 16 is an admixture of a metal and a non-metal as described above. The second portion 32 directly contacts the metal foil layer 14.

With reference back to FIG. 1, on a side 18 of metal foil layer 14 opposite the release layer 16, a bond strength enhancing agent 20 may be deposited. Suitable bond strength enhancing agents include electrolytically deposited copper dendrites having a height of between about 0.5 and 2 microns and a height to diameter aspect ratio of between about 3 and 10. Such dendrites may be electrolytically deposited from an aqueous solution containing copper ions and copper electrodes with the composite material 10 as the cathode. Pulses of DC current are applied between the anode and the cathode as more fully described in U.S. Pat. No. 4,515,671 to Polan, et al., that is incorporated by reference in its entirety herein.

Other bond strength enhancing agents include an electrolytically deposited mixture of chromium and zinc as disclosed in U.S. Pat. No. 5,230,932 to Lin, et al., a silane based coating as disclosed in U.S. Pat. No. 5,071,520 to Lin, et al., copper oxides, mechanical abrasion of surfaces, alternating current etching and micro-etching.

For the manufacture of a printed circuit board, the composite material 10 is bonded to a dielectric substrate 22 as illustrated in FIG. 2. Metal foil layer 14 may be laminated through the addition of heat and pressure to a rigid dielectric for the manufacture of a printed circuit board. Typical lamination parameters are a temperature of about 180° C. for 50 minutes. Optionally, a polymer adhesive may assist in formation of the bond. Typical rigid materials for the dielectric substrate include fiberglass reinforced epoxies such as FR4. The dielectric substrate may also be an electrically conductive material coated with a dielectric material such as a metal cored printed circuit board substrate or anodized aluminum.

Alternatively, as illustrated in FIG. 3, the dielectric substrate 22 is a flexible polymer film such as a polyimide or polyamide. In this instance, the use of a polymer bond agent 24 such an acrylic or epoxy polymer is preferred. As in the preceding embodiment, metal foil layer 14 is bonded to the dielectric substrate 22. Rather than laminating the flexible polymer to the metal foil layer, the flexible polymer may be cast on to the metal foil layer as a liquid or gel and cured to a flexible film.

After the composite material 10 is bonded to the dielectric substrate 22, the carrier layer 12 and release layer 16 are removed by mechanical means. Typically, removal is by applying a force to the carrier layer/release layer in one direction and an opposing force to the dielectric substrate/metal foil layer in a different direction. The forces may be either manually or mechanically applied. The force required for separation, referred to as peel strength, is at least 0.05 pound per inch and preferably at least 0.1 pound per inch. This minimum peel strength is required to prevent the metal foil layer 14 from separating from the support layer 12 prematurely, such as during transport or during bonding to the dielectric substrate. The peel strength should also be less than 2 pounds per inch and preferably less than 1 pound per inch to ensure that during removal the metal foil layer remains adhered to the dielectric substrate 22 and does not tear or partially remain with composite material 10. Preferably, the peel strength is between 0.1 pound per inch and 2.0 pounds per inch and more preferably between about 0.2 pound per inch and 1.0 pound per inch.

FIG. 4 is perspective view of metal foil layer 14 bonded to dielectric substrate 22. While FIG. 4 shows a single metal foil layer bonded to the dielectric substrate 22, additional metal foil layers may be bonded to top surface 25 of the metal foil layer to form a multi-layer printed circuit board.

With reference to FIG. 5, the metal foil layer 14 may be chemically etched to form a plurality of conductive features such as circuit traces 26 and die pads 28. Electrical isolation between conductive features is provided by dielectric substrate 22. Electrically conductive features may be formed by any process known in the art such as photolithography.

The following methods are useful for producing the composite material described above. It is recognized that variants of each method may be utilized and that different aspects of the various methods may be mixed together to produce a desired result. All methods generally require appropriate degreasing or cleaning as a first step and rinsing, such as with deionized water, between appropriate steps.

In accordance with a first embodiment, a carrier strip formed from copper or a copper alloy has a thickness effective to support a metal foil layer. An exemplary nominal thickness for the carrier strip is 70 microns. The carrier strip is immersed in a dilute aqueous, alkaline sodium dichromate solution having the parameters specified in Table 1. All solutions disclosed herein are aqueous, unless otherwise specified. When a single value is given, that value is nominal.

TABLE 1 Sodium hydroxide 10-50 grams per liter (g/l) (broad range) 20-35 g/l (preferred range) Chromium ions, such as from 0.1-10 g/l (broad range) sodium dichromate 0.5-5 g/l (preferred range) Operating Temperature 35° C.-50° C. pH Greater than 11 Counter Electrode Stainless steel Voltage 1 volt-3 volts Current Density 0.5-10 amps per square foot Anodic step (ASF) (broad range) 1-5 ASF (preferred range) Current Density 0.5-40 amps per square foot Cathodic step (ASF) (broad range) 1-20 ASF (preferred range) Time (anodic step) 1-60 seconds (broad range) 5-20 seconds (preferred) Time (cathodic step) 1-60 seconds (broad range) 5-20 seconds (preferred)

The carrier strip is immersed into an electrolytic cell containing the electrolyte and a voltage is impressed across the cell with the carrier strip as the anode. The anodic treatment generates a uniform microroughness on the surface of the carrier strip and induces a subsequent uniform metal foil layer copper deposit. On completion of the anodic treatment, the carrier strip is maintained in the same electrolyte and the polarity of the electrolytic cell is reversed. The carrier strip is made the cathode to deposit a thin, on the order of 10-300 angstrom, layer that is believed to be an admixture of chromium and chromium oxides on the carrier strip. This admixture forms the release layer that facilitates separation of the carrier strip subsequent to lamination or other processing.

The release layer is formed to a maximum thickness of about 300 angstroms. When the release layer thickness exceeds this maximum, the minimum peel strength requirements are not consistently achieved. Since the thickness of the release layer may be less than the microscopic surface roughness of the copper foil, the precursor anodic treatment is used to achieve a more uniform surface finish.

Subsequent to rinsing, a seed layer of copper with a nominal thickness of between 0.2 and 0.5 micron of copper is deposited on the release layer utilizing the parameters specified in Table 2.

TABLE 2 Copper ions, such as from 5-35 g/l (broad range) copper sulfate and/or 15-25 g/l (preferred copper pyrophosphate range) Optional inclusions of Amount as required leveling agents, complexing agents and surfactants Operating Temperature 35° C.-70° C. pH 6-10 Anode Material Stainless Steel or copper Voltage 3-7 volts Current Density 10-50 ASF Time 40-100 seconds

The seed layer forms a nucleating agent for the subsequent high speed deposition of a copper foil layer. While the seed layer is preferably formed from copper, it may be any electrically conductive metal that is etchable in the same chemical solutions as copper. Such other metals for the seed layer include copper alloys, chromium, molybdenum, tungsten, nickel, cobalt, etc. The seed layer protects the release layer from chemical attack in an electrolyte utilized to deposit the bulk of the metal foil layer thickness. Typically, to maximize manufacturing speed, an acid copper electrolyte as specified in Table 3 is utilized.

TABLE 3 Copper ions, such as from 20-80 g/l (broad) copper sulfate 50-70 g/l (preferred) Sulfuric acid 30-200 g/l (broad) 40-100 g/l (preferred) Operating Temperature 25° C.-60° C. pH Less than 1.5 Anode Material Lead or copper Voltage 5-10 volts Current Density 30-1000 ASF (broad) 40-500 ASF (preferred) Time 1-8 minutes (broad) 2-5 minutes (preferred)

To enhance adhesion, a dendritic treatment may be used to roughen the outside surface of the metal foil layer. One suitable dendritic treatment utilizes the parameters specified in Table 4. Alternatively, an anti-tarnish layer such as a mixture of chromium and zinc may be deposited to increase adhesion without increasing surface roughness.

TABLE 4 Copper ions, such as from 15-70 g/l (broad) copper sulfate 18-25 g/l (preferred) Sulfuric acid 10-200 g/l (broad) 35-100 g/l (preferred) Operating Temperature 25° C.-55° C. pH Less than 1.5 Anode Material Lead or copper Voltage 5-10 volts Current Density 50-1000 ASF (broad) 100-500 ASF (preferred) Time 4-30 seconds (broad) 4-10 seconds (preferred)

In a second embodiment, a carrier strip as described above is immersed in the solution of Table 1 for a time of from two to sixty seconds without utilizing electric current. A nominal 5 micron copper foil layer and dendritic treatment is then applied as above.

In accordance with a third embodiment of the invention, a copper carrier strip, as described above, is electrolytically coated with a thin, on the order of between 0.05 micron and 2 microns, layer of nickel utilizing the parameters described in Table 5.

TABLE 5 Nickel sulfamate 150-600 g/l (broad) 400-500 g/l (preferred) Nickel chloride 0-15 g/l Boric acid 25-50 g/l (broad) 35-45 g/l (preferred) Operating Temperature 45° C.-60° C. pH 2-5 Anode Material Nickel or Stainless Steel Voltage 0.5-5 volts Current Density 20-60 ASF Time 20-60 seconds

A chromium phosphate release layer is then applied over the thin layer of nickel by immersion in a dilute chromic acid/phosphoric acid solution having the parameters disclosed in Table 6.

TABLE 6 Chromic acid 0.1-20 g/l (broad) 0.2-10 g/l (preferred) Phosphoric acid 0.1-80 g/l (broad) 0.5-40 g/l (preferred) Operating Temperature 20° C.-60° C. pH 0.1-3 Time 5-120 seconds (broad) 10-40 seconds (preferred)

A nominal 5 micron copper foil metal layer is then deposited as above followed by a dendritic treatment as above.

In accordance with a fourth embodiment of the invention, a thin, on the order of between 0.05 micron and 2 microns, layer of nickel is deposited on a copper alloy carrier strip as above. A release layer is deposited from an aqueous solution containing sodium dioxide as disclosed in Table 7.

TABLE 7 Sodium hydroxide 10-80 g/l (broad) 20-50 g/l (preferred) Operating Temperature 35° C.- 60° C. pH Greater than 11 Counter Electrode Stainless steel or nickel Voltage 0.5-5 volts Current Density (anodic 10-50 ASF (broad) step) 25-35 ASF (preferred) Current Density (cathodic 5-40 ASF (broad) step) 10-25 ASF (preferred) Time (anodic step) 2-60 seconds 5-30 seconds Time (cathodic step) 2-60 seconds 5-30 seconds

The nickel coated carrier strip is first made anodic and then cathodic to form reduced nickel oxides. Approximately 5 microns of copper is then applied as the metal foil layer followed by a dendritic treatment as described above.

In each of embodiments 1-4, an alkaline copper plating bath was preferably used to deposit a seed layer having a thickness of from about 0.2 to about 0.5 micron of copper prior to depositing up to 5 microns of copper plating in an acidic bath. The initial use of an alkaline copper bath avoids potential attack to the chromium oxide, nickel oxide or nickel phosphate release layer as could happen in the acidic copper bath thus improving the reliability/integrity of the release interface. Embodiments five and six describe methods for forming a composite material having similar reliability and integrity without the need for an alkaline copper bath.

In embodiment five, a smooth nickel deposit is formed on the copper alloy carrier strip utilizing a suitable nickel plating bath, such as the nickel sulfamate electrolyte of Table 5. The nickel plated carrier strip is then immersed in an aqueous electrolyte containing sodium hydroxide utilizing the parameters recited in Table 6. The carrier strip is first made anodic and then cathodic. A copper metal foil layer is then deposited using a copper sulphate bath (Table 3) followed by dendritic treatment (Table 4).

In a sixth embodiment, a thin layer of nickel, having a thickness on the order of between 0.05 micron and 2 microns, is applied to the carrier strip (Table 5) as described above followed by treatment in an aqueous solution containing sodium hydroxide with the carrier strip first forming the anode and then the cathode as in Table 5. Next, the nickel is treated cathodically in an acid copper sulfate bath at low current density and the parameters illustrated in Table 8.

TABLE 8 Copper ions, such as from 40-80 g/l (broad) copper sulfate 60-70 g/l (preferred) Sulfuric acid 50-100 g/l (broad) 60-75 g/l (preferred) Operating Temperature 35° C.- 60° C. pH Less than 1 Cathode Material Lead or copper Voltage 5-8 volts Current Density 0.03-2 ASF (broad) 0.05-0.5 ASF (preferred) Time 30-120 seconds (broad) 45-90 seconds (preferred)

Copper deposition as in Table 3 is then utilized to increase the thickness up to a nominal 5 microns. Dendritic treatment as in Table 4 completes the process.

Composite materials formed from any one of the above processes may then be used to manufacture either printed circuit boards or flex circuits as described above. The advantages of the invention will become more apparent from the examples that follow.

EXAMPLES Example 1

A 2 oz. wrought copper foil was used as a carrier strip. The strip was electrocleaned in an alkaline commercial cleaner using 20 ASF current density for 40 sec. The foil was rinsed and then the release layer treatment was conducted in 20-35 g/l NaOH+0.5-5 g/l chromium ions as sodium dichromate solution using an anodic current of 1-5 ASF followed by a cathodic current of 1-20 ASF for 5-20 sec. The anodic treatment appeared to generate a uniform micro-roughness on the surface of the foil and induce a uniform copper deposit. The cathodic treatment appeared to deposit a transparent layer of chromium and chromium oxides, which is believed to be responsible for the release of the carrier strip after lamination.

A seed layer of 0.2-0.5 micron copper was electroplated in an alkaline copper plating solution. A 5 micron copper deposit was then electroplated, using 60-70 g/l copper ions as copper sulfate and 60-75 g/l sulfuric acid at 40-100 ASF for 5.4-2.1 minutes, followed by a dendritic copper or copper/nickel treatment. After lamination to an FR-4 epoxy substrate, the 2 oz carrier was easily peeled with a measured bond strength of 0.1-1.0 lb/in.

Example 2

A 2 oz. wrought copper foil was used as a carrier strip. The strip was electrocleaned in an alkaline commercial cleaner using 20 ASF current density for 40 sec. The foil was rinsed and then the release layer treatment applied by electroplating in a solution of 20-35 g/l NaOH+0.5-5 g/l chromium ions as sodium dichromate. This treatment appeared to form a transparent layer of chromium and chromium oxides.

A seed layer of 0.2-0.5 micron copper was electroplated in an alkaline copper plating solution. A 5 micron copper deposit was then electroplated using 60-70 g/l copper ions as copper sulfate and 60-75 g/l sulfuric acid at 40-100 ASF for 5.4-2.1 minutes, followed by a dendritic copper or copper/nickel treatment. After lamination to an FR-4 epoxy substrate, the 2 oz. carrier was easily peeled with a measured bond strength of 0.1-1.0 lb/in.

Example 3

After cleaning the copper carrier strip, a nickel layer was first electroplated with 0.15 micron nickel in a nickel sulfamate bath at 30 ASF for 20 sec. The foil was then immersed in a solution containing 0.2-10.0 g/l chromic acid and 0.5-40 g/l phosphoric acid for 10-40 sec at ambient temperature. The alkaline copper seed layer and acidic copper plating were conducted as described in Example 1. A peelable foil resulted after lamination with 0.2-2.0 lb/in release force.

Example 4

As in Example 2, a nickel layer was first electroplated. The nickel surface was then anodically treated in a 20-50 g/l NaOH solution at 0.5-10 ASF for 5-30 sec to generate a nickel oxide release layer. This nickel oxide layer was then cathodically reduced in a 20-50 g/l NaOH solution at 0.5-50 ASF for 5-30 sec. This cathodic treatment appeared to produce reduced oxides and enlarge the operating window. Without the cathodic treatment, if the anodic current is too low, a non-peelable foil would be produced. If the anodic current is too high, the plated 5 micron foil often delaminates or forms blister even before lamination and renders the product useless.

After the nickel and nickel oxide treatment, the alkaline copper seed layer and 5 micron acidic copper are deposited. A release force of 0.35-1.0 lb/in was obtained.

Example 5

Use of a copper seed layer may be problematic from the standpoint of foil production for other reasons not the least of these is the fact that the process uses non-consumable (stainless steel) anodes. Hence during operation of a production line, the copper content of the electrolyte must be held constant by the addition of soluble copper ions. Such occurs by the additions of appropriate replenishment salts supplied by the manufacturer of the plating bath. Thus while the bath copper content can be maintained, the concentration of other chemical species (pyrophosphate, phosphate, sulfate, etc.) must increase. In this example, the inventors have identified an approach that is accomplished without need for a seed layer from an alkaline copper bath.

The formation of a smooth nickel deposit onto a carrier strip has been shown to be very easily accomplished by deposition out of a nickel sulfamate bath using a current density of 30 to 50 ASF with times of 20 to 30 seconds.

Treatment of the nickel plate in a solution of 30 g/l sodium hydroxide was then conducted with an anodic treatment of 20 to 40 ASF for 20 to 40 seconds with subsequent cathodic treatment in the same solution at 25% to 50% of the anodic current density and for half the time. No seed layer was used, rather the nickel coated support layer was cathodically treated in acid-copper sulfate bath at low current density, 60 seconds at 0.03 to 2 ASF, followed by plating of copper from the acid copper sulfate bath at 65 ASF for 3.5 minutes to achieve the desired 5 micron thickness. The foils retained their peelability following lamination.

For comparison, it was demonstrated that the above low current treatment resulted in peelable foils free of defects while foils made using identical conditions, but without the low current treatment, were full of defects and not peelable following lamination.

It is apparent that there has been provided in accordance with the present invention a composite material including a releasable metal foil layer and methods for the manufacture of such a composite material that fully satisfies the objects, means and advantages as set forth herein above. While the invention has been described in combination with embodiments thereof, it is evident that many alternatives, modifications and variations will be apparent to those skilled in the art in light of the foregoing description. Accordingly, it is intended to embrace all such alternatives, modifications and variations as fall within the spirit and broad scope of the appended claims. 

We claim:
 1. A method for the manufacture of a composite material comprising the steps of: providing an electrically conductive support layer; anodically treating said electrically conductive support layer in a first aqueous electrolyte containing first metal ions and hydroxide ions to produce an anodically treated electrically conductive support layer; subsequent to said anodically treating step, cathodically depositing a release layer onto said anodically treated electrically conductive support layer in a second aqueous electrolyte containing second metal ions and hydroxide ions; and electrolytically depositing a metal foil layer on said release layer.
 2. The method of claim 1 wherein said first aqueous electrolyte is selected to contain sodium hydroxide and chromium ions.
 3. The method of claim 2 wherein said cathodically depositing step is effective to deposit an admixture of chromium and chromium oxide having a thickness of up to 300 angstroms.
 4. The method of claim 3 wherein said electrolytically depositing a metal foil layer step includes first depositing a copper seed layer from an alkaline copper electrolyte and then depositing a bulk copper layer from an acidic copper electrolyte.
 5. The method of claim 4 wherein said metal foil layer is formed to a total thickness of less than 10 microns with said copper seed layer formed to a thickness of between 0.2 micron and 0.5 micron.
 6. The method of claim 5 including the further steps of laminating said metal foil layer to a dielectric substrate and then separating said electrically conductive support layer and said release layer from a laminate comprising said dielectric substrate and metal foil layer.
 7. The method of claim 6 including the further step of forming said metal foil layer into a plurality of electrically isolated circuit traces.
 8. A method for the manufacture of a composite material comprising the steps of: providing an electrically conductive support layer; forming a release layer on said electrically conductive support layer, said release layer comprising a first portion and a second portion, said forming step comprising the steps of: (i) electrolytically depositing said first portion of said release layer adjacent said electrically conductive support layer, said first portion of said release layer being a metal selected from the group consisting of nickel, chromium and mixtures thereof; and (ii) applying said second portion of said release layer over said first portion by immersion coating, said second portion of said release layer being an admixture of chromium and chromium phosphate; and electrolytically depositing a metal foil layer on said release layer.
 9. The method of claim 8 wherein said electrolytically depositing a metal foil layer step includes first depositing a copper seed layer from an alkaline copper electrolyte and then depositing a bulk copper layer from an acidic copper electrolyte.
 10. The method of claim 9 wherein said metal foil layer is formed to a total thickness of less than 10 microns with said copper seed layer formed to a thickness of between 0.2 micron and 0.5 micron. 